Fichtner J, Wu Y, Hitzenberger J, Drewello T, Bachmann J (2017)
Publication Type: Conference contribution
Publication year: 2017
Publisher: Electrochemical Society Inc.
Book Volume: 80
Pages Range: 63-73
Conference Proceedings Title: ECS Transactions
Event location: National Harbor, MD, USA
ISBN: 9781607688204
We present a procedure for growing thin films of an organic polyamid material based on a cyclic repetition of two consecutive, complementary, self-limiting surface reactions. The molecular compounds that react with the surface are dissolved in an organic solvent. This new method exemplifies how atomic layer deposition (ALD) and molecular layer deposition (MLD) can benefit from being transferred from the gas phase to the liquid phase, given that a broad variety of advantageous reagents are only available in dissolved form.
APA:
Fichtner, J., Wu, Y., Hitzenberger, J., Drewello, T., & Bachmann, J. (2017). Molecular layer deposition from dissolved precursors. In Fred Roozeboom, Stefan De Gendt, Jeffrey W. Elam, Oscar van der Straten, Jolien Dendooven, Chanyuan Liu (Eds.), ECS Transactions (pp. 63-73). National Harbor, MD, USA: Electrochemical Society Inc..
MLA:
Fichtner, Johannes, et al. "Molecular layer deposition from dissolved precursors." Proceedings of the 13th Symposium on Atomic Layer Deposition Applications, ALD 2017- 232nd ECS Meeting, National Harbor, MD, USA Ed. Fred Roozeboom, Stefan De Gendt, Jeffrey W. Elam, Oscar van der Straten, Jolien Dendooven, Chanyuan Liu, Electrochemical Society Inc., 2017. 63-73.
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