Stabilizing an ultrathin MoS2 layer during electrocatalytic hydrogen evolution with a crystalline SnO2 underlayer

Englhard J, Cao Y, Bochmann S, Barr M, Cadot S, Quadrelli EA, Bachmann J (2021)

Publication Type: Journal article

Publication year: 2021

Journal

RSC Advances Royal Society of Chemistry

Book Volume: 11

Pages Range: 17985-17992

Journal Issue: 29

DOI: 10.1039/D1RA00877C

Open Access Link: https://pubs.rsc.org/en/content/articlepdf/2021/ra/d1ra00877c

Authors with CRIS profile

Jonas Englhard Lehrstuhl für Chemistry of thin film materials Yuanyuan Cao Lehrstuhl für Chemistry of thin film materials Sebastian Bochmann Lehrstuhl für Chemistry of thin film materials Maissa Barr Lehrstuhl für Chemistry of thin film materials Julien Bachmann Lehrstuhl für Chemistry of thin film materials

Involved external institutions

Université Claude Bernard Lyon 1 (UCB) FR France (FR)

How to cite

APA:

Englhard, J., Cao, Y., Bochmann, S., Barr, M., Cadot, S., Quadrelli, E.A., & Bachmann, J. (2021). Stabilizing an ultrathin MoS2 layer during electrocatalytic hydrogen evolution with a crystalline SnO2 underlayer. RSC Advances, 11(29), 17985-17992. https://doi.org/10.1039/D1RA00877C

MLA:

Englhard, Jonas, et al. "Stabilizing an ultrathin MoS2 layer during electrocatalytic hydrogen evolution with a crystalline SnO2 underlayer." RSC Advances 11.29 (2021): 17985-17992.

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