Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths

Lv P, Cao GF, Wen LJ, Kharusi SA, Anton G, Arnquist IJ, Badhrees I, Barbeau PS, Beck D, Belov V, Bhatta T, Breur PA, Brodsky JP, Brown E, Brunner T, Mamahit SB, Caden E, Cao L, Chambers C, Chana B, Charlebois SA, Chiu M, Cleveland B, Coon M, Craycraft A, Dalmasson J, Daniels T, Darroch L, St. Croix AD, Mesrobian-Kabakian AD, Deslandes K, Devoe R, Vacri MLD, Dilling J, Ding YY, Dolinski MJ, Doria L, Dragone A, Echevers J, Edaltafar F, Elbeltagi M, Fabris L, Fairbank D, Fairbank W, Farine J, Ferrara S, Feyzbakhsh S, Fucarino A, Gallina G, Gautam P, Giacomini G, Goeldi D, Gornea R, Gratta G, Hansen EV, Heffner M, Hoppe EW, Hobl J, House A, Hughes M, Iverson A, Jamil A, Jewell MJ, Jiang XS, Karelin A, Kaufman LJ, Koffas T, Krucken R, Kuchenkov A, Kumar KS, Lan Y, Larson A, Leach KG, Lenardo BG, Leonard DS, Li G, Li S, Li Z, Licciardi C, Maclellan R, Massacret N, Mcelroy T, Medina-Peregrina M, Michel T, Mong B, Moore DC, Murray K, Nakarmi P, Natzke CR, Newby RJ, Ning Z, Njoya O, Nolet F, Nusair O, Odgers K, Odian A, Oriunno M, Orrell JL, Ortega GS, Ostrovskiy I, Overman CT, Parent S, Piepke A, Pocar A, Pratte JF, Radeka V, Raguzin E, Rescia S, Retiere F, Richman M, Robinson A, Rossignol T, Rowson PC, Roy N, Runge J, Saldanha R, Sangiorgio S, Skarpaas K, Soma AK, St-Hilaire G, Stekhanov V, Stiegler T, Sun XL, Tarka M, Todd J, Totev TI, Tsang R, Tsang T, Vachon F, Veeraraghavan V, Viel S, Visser G, Vivo-Vilches C, Vuilleumier JL, Wagenpfeil M, Wager T, Walent M, Wang Q, Watkins J, Wei W, Wichoski U, Wu SX, Wu WH, Wu X, Xia Q, Yang H, Yang L, Zeldovich O, Zhao J, Zhou Y, Ziegler T (2020)

Publication Type: Journal article

Publication year: 2020

Journal

Book Volume: 67

Pages Range: 2501-2510

Journal Issue: 12

DOI: 10.1109/TNS.2020.3035172

Abstract

Characterization of the vacuum ultraviolet (VUV) reflectance of silicon photomultipliers (SiPMs) is important for large-scale SiPM-based photodetector systems. We report the angular dependence of the specular reflectance in vacuum of SiPMs manufactured by Fondazionc Bruno Kessler (FBK) and Hamamatsu Photonics K.K. (HPK) over wavelengths ranging from 120 to 280 nm. Refractive index and extinction coefficient of the thin silicon-dioxide film deposited on the surface of the FBK SiPMs are derived from reflectance data of an FBK silicon wafer with the same deposited oxide film as SiPMs. The diffuse reflectance of SiPMs is also measured at 193 nm. We use the VUV spectral dependence of the optical constants to predict the reflectance of the FBK silicon wafer and FBK SiPMs in liquid xenon.

Authors with CRIS profile

Involved external institutions

University of Massachusetts Amherst (UMass) United States (USA) (US) Stanford National Accelerator Laboratory (SLAC) United States (USA) (US) Université de Sherbrooke Canada (CA) University of Alabama in Huntsville (UAH) United States (USA) (US) Triumf Canada (CA) Pacific Northwest National Laboratory United States (USA) (US) Brookhaven National Laboratory United States (USA) (US) Rensselaer Polytechnic Institute (RPI) United States (USA) (US) Colorado School of Mines United States (USA) (US) McGill University Canada (CA) Carleton University Canada (CA) Drexel University United States (USA) (US) Chinese Academy of Sciences (CAS) / 中国科学院 China (CN) Yale University United States (USA) (US) Oak Ridge National Laboratory United States (USA) (US) University of South Dakota United States (USA) (US) University of Illinois at Urbana-Champaign United States (USA) (US) Laurentian University Canada (CA) Colorado State University United States (USA) (US) Lawrence Livermore National Laboratory United States (USA) (US) University of North Carolina at Chapel Hill United States (USA) (US) National Research Centre "Kurchatov Institute" / Hациональный исследовательский центр "Курчатовский Институт" Russian Federation (RU) Duke University United States (USA) (US) Stanford University United States (USA) (US) Universität Bern Switzerland (CH) Indiana University United States (USA) (US) University of California, San Diego United States (USA) (US) Institute for Basic Science Korea, Republic of (KR) State University of New York at Albany (UNY Albany / UAlbany) United States (USA) (US)

How to cite

APA:

Lv, P., Cao, G.F., Wen, L.J., Kharusi, S.A., Anton, G., Arnquist, I.J.,... Ziegler, T. (2020). Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths. IEEE Transactions on Nuclear Science, 67(12), 2501-2510. https://doi.org/10.1109/TNS.2020.3035172

MLA:

Lv, P., et al. "Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths." IEEE Transactions on Nuclear Science 67.12 (2020): 2501-2510.

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