Prihoda A, Will J, Duchstein P, Becit B, Lossin F, Schindler T, Berlinghof M, Steinrück HG, Bertram F, Zahn D, Unruh T (2020)
Publication Type: Journal article
Publication year: 2020
Book Volume: 36
Pages Range: 12077-12086
Journal Issue: 40
DOI: 10.1021/acs.langmuir.0c02745
The mechanism behind the stability of organic nanoparticles prepared by liquid antisolvent (LAS) precipitation without a specific stabilizing agent is poorly understood. In this work, we propose that the organic solvent used in the LAS process rapidly forms a molecular stabilizing layer at the interface of the nanoparticles with the aqueous dispersion medium. To confirm this hypothesis, n-octadecyltrichlorosilane (OTS)-functionalized silicon wafers in contact with water-solvent mixtures were used as a flat model system mimicking the solid-liquid interface of the organic nanoparticles. We studied the equilibrium structure of the interface by X-ray reflectometry (XRR) for water-solvent mixtures (methanol, ethanol, 1-propanol, 2-propanol, acetone, and tetrahydrofuran). The formation of an organic solvent-rich layer at the solid-liquid interface was observed. The layer thickness increases with the organic solvent concentration and correlates with the polar and hydrogen bond fraction of Hansen solubility parameters. We developed a self-consistent adsorption model via complementing adsorption isotherms obtained from XRR data with molecular dynamics simulations.
APA:
Prihoda, A., Will, J., Duchstein, P., Becit, B., Lossin, F., Schindler, T.,... Unruh, T. (2020). Interface between Water-Solvent Mixtures and a Hydrophobic Surface. Langmuir, 36(40), 12077-12086. https://doi.org/10.1021/acs.langmuir.0c02745
MLA:
Prihoda, Annemarie, et al. "Interface between Water-Solvent Mixtures and a Hydrophobic Surface." Langmuir 36.40 (2020): 12077-12086.
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