Self-Metalation of Porphyrins by Cobalt Oxide: Photoemission Spectroscopic Investigation
Wang C, Wang R, Hauns J, Fauster T (2020)
Publication Type: Journal article
Publication year: 2020
Journal
Book Volume: 124
Pages Range: 14167-14175
Journal Issue: 26
Abstract
Understanding the electronic structure between porphyrins and ultrathin metal-oxide film interfaces is vital for the rational design of functional molecular architectures. Here, we have studied the interfacial electronic properties of porphyrin molecular thin films on well-ordered thin layers of CoO(111) and metallic Co(100) surfaces by means of X-ray and ultraviolet photoemission spectroscopies. In this work, we observed the direct self-metalation of free-base porphyrin molecules at the interface to CoO(111) at room temperature by monitoring the N 1s core-level evolution. On metallic Co(100) films, no metalation occurs, but it can be induced by exposure to oxygen. The oxygen-induced metalation has, to the best of our knowledge, not been reported until now and might play an important role in processes where porphyrins are exposed to metals in a reactive environment.
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APA:
Wang, C., Wang, R., Hauns, J., & Fauster, T. (2020). Self-Metalation of Porphyrins by Cobalt Oxide: Photoemission Spectroscopic Investigation. Journal of Physical Chemistry C, 124(26), 14167-14175. https://doi.org/10.1021/acs.jpcc.0c01722
MLA:
Wang, Can, et al. "Self-Metalation of Porphyrins by Cobalt Oxide: Photoemission Spectroscopic Investigation." Journal of Physical Chemistry C 124.26 (2020): 14167-14175.
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