Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon

Nakarmi P, Ostrovskiy I, Soma AK, Retière F, Kharusi SA, Alfaris M, Anton G, Arnquist IJ, Badhrees I, Barbeau PS, Beck D, Belov V, Bhatta T, Blatchford J, Breur PA, Brodsky JP, Brown E, Brunner T, Mamahit SB, Caden E, Cao GF, Cao L, Chambers C, Chana B, Charlebois SA, Chiu M, Cleveland B, Coon M, Craycraft A, Dalmasson J, Daniels T, Darroch L, Croix ADS, Mesrobian-Kabakian AD, Devoe R, Vacri ML, Dilling J, Ding YY, Dolinski MJ, Doria L, Dragone A, Echevers J, Edaltafar F, Elbeltagi M, Fabris L, Fairbank D, Fairbank W, Farine J, Ferrara S, Feyzbakhsh S, Fontaine R, Fucarino A, Gallina G, Gautam P, Giacomini G, Goeldi D, Gornea R, Gratta G, Hansen EV, Heffner M, Hoppe EW, Hößl J, House A, Hughes M, Iverson A, Jamil A, Jewell MJ, Jiang XS, Karelin A, Kaufman LJ, Koffas T, Krücken R, Kuchenkov A, Kumar KS, Lan Y, Larson A, Leach KG, Lenardo BG, Leonard DS, Li G, Li S, Li Z, Licciardi C, Lv P, Maclellan R, Massacret N, McElroy T, Medina-Peregrina M, Michel T, Mong B, Moore DC, Murray K, Natzke CR, Newby RJ, Ning Z, Njoya O, Nolet F, Nusair O, Odgers K, Odian A, Oriunno M, Orrell JL, Ortega GS, Overman CT, Parent S, Piepke A, Pocar A, Pratte JF, Radeka V, Raguzin E, Rescia S, Richman M, Robinson A, Rossignol T, Rowson PC, Roy N, Runge J, Saldanha R, Sangiorgio S, Viii KS, St-Hilaire G, Stekhanov V, Stiegler T, Sun XL, Tarka M, Todd J, Totev TI, Tsang R, Tsang T, Vachon F, Veeraraghavan V, Viel S, Visser G, Vivo-Vilches C, Vuilleumier JL, Wagenpfeil M, Wager T, Walent M, Wang Q, Ward M, Watkins J, Weber M, Wei W, Wen LJ, Wichoski U, Wu SX, Wu WH, Wu X, Xia Q, Yang H, Yang L, Zeldovich O, Zhao J, Zhou Y, Ziegler T (2020)


Publication Type: Journal article

Publication year: 2020

Journal

Book Volume: 15

Article Number: P01019

Journal Issue: 1

DOI: 10.1088/1748-0221/15/01/P01019

Abstract

Understanding reflective properties of materials and photodetection efficiency (PDE) of photodetectors is important for optimizing energy resolution and sensitivity of the next generation neutrinoless double beta decay, direct detection dark matter, and neutrino oscillation experiments that will use noble liquid gases, such as nEXO, DARWIN, DarkSide-20k, and DUNE . Little information is currently available about reflectivity and PDE in liquid noble gases, because such measurements are difficult to conduct in a cryogenic environment and at short enough wavelengths. Here we report a measurement of specular reflectivity and relative PDE of Hamamatsu VUV4 silicon photomultipliers (SiPMs) with 50 μm micro-cells conducted with xenon scintillation light (∼175 nm) in liquid xenon. The specular reflectivity at 15ˆ incidence of three samples of VUV4 SiPMs is found to be 30.4±1.4%, 28.6±1.3%, and 28.0±1.3%, respectively. The PDE at normal incidence differs by ±8% (standard deviation) among the three devices. The angular dependence of the reflectivity and PDE was also measured for one of the SiPMs. Both the reflectivity and PDE decrease as the angle of incidence increases. This is the first measurement of an angular dependence of PDE and reflectivity of a SiPM in liquid xenon.

Authors with CRIS profile

Involved external institutions

The University of Alabama US United States (USA) (US) Triangle Universities Nuclear Laboratory US United States (USA) (US) Institute for Theoretical and Experimental Physics (ITEP) /Институт теоретической и экспериментальной физики RU Russian Federation (RU) McGill University CA Canada (CA) University of Massachusetts Amherst (UMass) US United States (USA) (US) Triumf CA Canada (CA) Stanford University US United States (USA) (US) Chinese Academy of Sciences (CAS) / 中国科学院 CN China (CN) Lawrence Livermore National Laboratory US United States (USA) (US) Rensselaer Polytechnic Institute (RPI) US United States (USA) (US) Colorado State University US United States (USA) (US) University of Illinois at Urbana-Champaign US United States (USA) (US) Institute of High Energy Physics (IHEP) / 中国科学院高能物理研究所 CN China (CN) Laurentian University CA Canada (CA) Carleton University CA Canada (CA) Brookhaven National Laboratory US United States (USA) (US) Yale University US United States (USA) (US) Drexel University US United States (USA) (US) Université de Sherbrooke CA Canada (CA) Stanford National Accelerator Laboratory (SLAC) US United States (USA) (US) State University of New York at Albany (UNY Albany / UAlbany) US United States (USA) (US) Colorado School of Mines US United States (USA) (US) Oak Ridge National Laboratory US United States (USA) (US) Pacific Northwest National Laboratory US United States (USA) (US) University of South Dakota US United States (USA) (US) Indiana University US United States (USA) (US) Universität Bern CH Switzerland (CH) Institute for Basic Science KR Korea, Republic of (KR) University of North Carolina Wilmington (UNCW) US United States (USA) (US)

How to cite

APA:

Nakarmi, P., Ostrovskiy, I., Soma, A.K., Retière, F., Kharusi, S.A., Alfaris, M.,... Ziegler, T. (2020). Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon. Journal of Instrumentation, 15(1). https://doi.org/10.1088/1748-0221/15/01/P01019

MLA:

Nakarmi, P., et al. "Reflectivity and PDE of VUV4 Hamamatsu SiPMs in liquid xenon." Journal of Instrumentation 15.1 (2020).

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