The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition

Hoeflich K, Yang RB, Berger A, Leuchs G, Christiansen S (2011)

Publication Type: Journal article

Publication year: 2011

Journal

Advanced Materials Wiley

Book Volume: 23

Pages Range: 2657-2661

Journal Issue: 22-23

DOI: 10.1002/adma.201004114

Abstract

Various nanostructures are directly written by electron-beam-induced deposition using dimethyl-gold(III)-acetylacetonate as the precursor gas. After purification, their potential applications include plasmonic devices and metamaterials. Carbon contamination of the as-written structures can be completely removed by low-temperature ozone treatment, leaving polycrystalline pure gold structures (see figure). This treatment reduces the size of the nanostructures but does not substantially alter their functional shape.

Authors with CRIS profile

Gerhard Leuchs Lehrstuhl für Experimentalphysik

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials (EAM)

Involved external institutions

Leibniz-Institut für Photonische Technologien e.V. DE Germany (DE) Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics DE Germany (DE)

How to cite

APA:

Hoeflich, K., Yang, R.B., Berger, A., Leuchs, G., & Christiansen, S. (2011). The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition. Advanced Materials, 23(22-23), 2657-2661. https://doi.org/10.1002/adma.201004114

MLA:

Hoeflich, Katja, et al. "The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition." Advanced Materials 23.22-23 (2011): 2657-2661.

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