Yousefi P, McNeur J, Kozak M, Niedermayer U, Gannott F, Lohse O, Boine-Frankenheim O, Hommelhoff P (2018)
Publication Language: English
Publication Type: Journal article
Publication year: 2018
Pages Range: 221-223
Journal Issue: 909
URI: https://arxiv.org/abs/1801.05234
DOI: 10.1016/j.nima.2018.01.065
Open Access Link: https://arxiv.org/abs/1801.05234
Dielectric laser accelerators (DLAs) have proven to be good candidates for miniaturized particle accelerators. They rely on micro-fabricated dielectrics which are able to modulate the kinetic energy of the incoming electron beam under a proper laser illumination. In this paper we demonstrate a dual pillar structure with a distributed Bragg reflector to mimic a double sided illumination to the electron path. The structure is fabricated by an electron beam lithography technique followed by a cryogenic reactive ion etching process. Such a structure can accelerate the injected 28 keV electrons by a gradient of approximately 150 MeV/m which can be further optimized towards the GeV/m regime.
APA:
Yousefi, P., McNeur, J., Kozak, M., Niedermayer, U., Gannott, F., Lohse, O.,... Hommelhoff, P. (2018). Silicon dual pillar structure with a distributed Bragg reflector for dielectric laser accelerators: Design and fabrication. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 909, 221-223. https://doi.org/10.1016/j.nima.2018.01.065
MLA:
Yousefi, Peyman, et al. "Silicon dual pillar structure with a distributed Bragg reflector for dielectric laser accelerators: Design and fabrication." Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 909 (2018): 221-223.
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