Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation

Strauß J, Baum M, Alexeev I, Schmidt M (2015)

Publication Language: English

Publication Type: Conference contribution, Original article

Publication year: 2015

Event location: Japan JP

Abstract

In this publication we present a novel setup for Optical Trap Assisted Nanopatterning (OTAN) technology. The setup allows for parallelization and thus for higher throughput in this inventive and flexible direct-nanopatterning technology. In addition we present first results of parallel nanoscale structuring. We determine the stiffness of optical traps and compare the result to previous results of single OTAN. Furthermore we estimate the increase of throughput for the parallelized approach with respect to the conventional system.

Authors with CRIS profile

Johannes Strauß Lehrstuhl für Photonische Technologien (LPT) Marcus Baum Lehrstuhl für Photonische Technologien (LPT) Ilya Alexeev Lehrstuhl für Photonische Technologien (LPT) Michael Schmidt Lehrstuhl für Photonische Technologien (LPT)

How to cite

APA:

Strauß, J., Baum, M., Alexeev, I., & Schmidt, M. (2015). Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation. In Proceedings of the International Congress on Laser Advanced Materials Processing. Japan, JP.

MLA:

Strauß, Johannes, et al. "Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation." Proceedings of the International Congress on Laser Advanced Materials Processing, Japan 2015.

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