Gateless patterning of epitaxial graphene by local intercalation

Sorger C, Hertel S, Jobst J, Steiner C, Meil K, Ullmann K, Albert A, Wang Y, Krieger M, Ristein J, Maier S, Weber HB (2015)

Publication Type: Journal article

Publication year: 2015


Publisher: Institute of Physics: Hybrid Open Access

Book Volume: 26

Pages Range: 025302

DOI: 10.1088/0957-4484/26/2/025302


We present a technique to pattern the charge density of a large-area epitaxial graphene sheet locally without using metallic gates. Instead, local intercalation of the graphene-substrate interface can selectively be established in the vicinity of graphene edges or prede fined voids. It provides changes of the work function of several hundred meV, corresponding to a conversion from n-type to p-type charge carriers. This assignment is supported by photoelectron spectroscopy, scanning tunneling microscopy, scanning electron microscopy and Hall effect measurements. The technique introduces materials contrast to a graphene sheet in a variety of geometries and thus allows for novel experiments and novel functionalities.

Authors with CRIS profile

Additional Organisation(s)

Related research project(s)

How to cite


Sorger, C., Hertel, S., Jobst, J., Steiner, C., Meil, K., Ullmann, K.,... Weber, H.B. (2015). Gateless patterning of epitaxial graphene by local intercalation. Nanotechnology, 26, 025302.


Sorger, Christian, et al. "Gateless patterning of epitaxial graphene by local intercalation." Nanotechnology 26 (2015): 025302.

BibTeX: Download