Electrons as "Invisible Ink": Fabrication of nanostructures by local electron beam induced activation of SiOx

Walz MM, Schirmer M, Vollnhals F, Lukasczyk T, Steinrück HP, Marbach H (2010)

Publication Type: Journal article

Publication year: 2010

Journal

Angewandte Chemie International Edition Wiley

Original Authors: Walz M.-M., Schirmer M., Vollnhals F., Lukasczyk T., Steinrück H.-P., Marbach H.

Publisher: Wiley-VCH Verlag

Book Volume: 49

Pages Range: 4669-4673

Journal Issue: 27

DOI: 10.1002/anie.201001308

Abstract

Figure Presented Beam me up: A novel two-step process allows iron nanostructures to be generated locally on SiO/Si at 300 K. The surface is first locally activated by an electron beam. Then the activated structures are exposed to [Fe(CO)], which decomposes and grows autocatalytically to give pure Fe nanocrystals. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

Authors with CRIS profile

Marie-Madeleine Walz Lehrstuhl für Physikalische Chemie II Michael Schirmer Lehrstuhl für Physikalische Chemie II Florian Vollnhals Lehrstuhl für Physikalische Chemie II Hans-Peter Steinrück Lehrstuhl für Physikalische Chemie II Hubertus Marbach Naturwissenschaftliche Fakultät

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials

How to cite

APA:

Walz, M.-M., Schirmer, M., Vollnhals, F., Lukasczyk, T., Steinrück, H.-P., & Marbach, H. (2010). Electrons as "Invisible Ink": Fabrication of nanostructures by local electron beam induced activation of SiOx. Angewandte Chemie International Edition, 49(27), 4669-4673. https://doi.org/10.1002/anie.201001308

MLA:

Walz, Marie-Madeleine, et al. "Electrons as "Invisible Ink": Fabrication of nanostructures by local electron beam induced activation of SiOx." Angewandte Chemie International Edition 49.27 (2010): 4669-4673.

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