Wu M, Trampert A, Al-Zoubi T, Benyoucef M, Reithmaier JP (2015)
Publication Status: Published
Publication Type: Journal article
Publication year: 2015
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Book Volume: 90
Pages Range: 133-139
DOI: 10.1016/j.actamat.2015.02.042
We present a quantitative transmission electron microscopy (TEM) study about the interface structure and strain state of buried InAs nano-clusters in Si(001) grown by molecular beam epitaxy. The nano-clusters show a typical polyhedral shape of 4-12 nm in diameter with {111} and {001} interface planes. Moire fringe analysis based on dark-field images and high-resolution (HR) TEM reveals that the nano-clusters are almost fully relaxed via the creation of misfit dislocation loops that are restricted only in the InAs/Si interface region, whereas the Si matrix is defect-free. Nevertheless, depending on the individual shape of the nano-clusters, a small amount of anisotropic residual strain in the nano-clusters is identified via strain mapping by geometric phase analysis. The scenario of mismatch stress relaxation by the formation of dislocation loops is discussed with a theoretical model based on continuum elasticity which qualitatively explains the experimental results. (C) 2015 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
APA:
Wu, M., Trampert, A., Al-Zoubi, T., Benyoucef, M., & Reithmaier, J.P. (2015). Interface structure and strain state of InAs nano-clusters embedded in silicon. Acta Materialia, 90, 133-139. https://doi.org/10.1016/j.actamat.2015.02.042
MLA:
Wu, Mingjian, et al. "Interface structure and strain state of InAs nano-clusters embedded in silicon." Acta Materialia 90 (2015): 133-139.
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