Origin of Doping in Quasi-Free-Standing Graphene on Silicon Carbide

Ristein J, Mammadov S, Seyller T (2012)

Publication Type: Journal article

Publication year: 2012


Publisher: American Physical Society

Book Volume: 108

Pages Range: 246104

DOI: 10.1103/PhysRevLett.108.246104


We explain the robust p-type doping observed for quasi-free-standing graphene on hexagonal silicon carbide by the spontaneous polarization of the substrate. This mechanism is based on a bulk property of SiC, unavoidable for any hexagonal polytype of the material and independent of any details of the interface formation. We show that sign and magnitude of the polarization are in perfect agreement with the doping level observed in the graphene layer. With this mechanism, models based on hypothetical acceptor-type defects as they are discussed so far are obsolete. The n-type doping of epitaxial graphene is explained conventionally by donorlike states associated with the buffer layer and its interface to the substrate that overcompensate the polarization doping. © 2012 American Physical Society.

Authors with CRIS profile

How to cite


Ristein, J., Mammadov, S., & Seyller, T. (2012). Origin of Doping in Quasi-Free-Standing Graphene on Silicon Carbide. Physical Review Letters, 108, 246104. https://dx.doi.org/10.1103/PhysRevLett.108.246104


Ristein, Jürgen, Samir Mammadov, and Thomas Seyller. "Origin of Doping in Quasi-Free-Standing Graphene on Silicon Carbide." Physical Review Letters 108 (2012): 246104.

BibTeX: Download