Plasma induced damage monitoring for HDP processes

Beyer A, Hausmann A, Junack M, Radecker J, Ruf A, Dirnecker T (2002)

Publication Type: Conference contribution

Publication year: 2002

Publisher: American Vacuum Soc.

City/Town: Santa Clara, USA

Pages Range: 84-87

Conference Proceedings Title: Proc. 7th Int. Symp. On Plasma & Process Induced Damage

Event location: Maui, Hawaii, USA

DOI: 10.1109/PPID.2002.1042615

Authors with CRIS profile

Tobias Dirnecker Lehrstuhl für Elektronische Bauelemente

Involved external institutions

Infineon Technologies Dresden GmbH & Co. KG DE Germany (DE)

How to cite

APA:

Beyer, A., Hausmann, A., Junack, M., Radecker, J., Ruf, A., & Dirnecker, T. (2002). Plasma induced damage monitoring for HDP processes. In Proc. 7th Int. Symp. On Plasma & Process Induced Damage (pp. 84-87). Maui, Hawaii, USA: Santa Clara, USA: American Vacuum Soc..

MLA:

Beyer, A., et al. "Plasma induced damage monitoring for HDP processes." Proceedings of the 7th Int. Symp. On Plasma & Process Induced Damage, Maui, Hawaii, USA Santa Clara, USA: American Vacuum Soc., 2002. 84-87.

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