Extrinsic corrugation-assisted mechanical exfoliation of monolayer graphene

Pang S, Englert J, Tsao HN, Hernandez Y, Hirsch A, Feng X, Muellen K (2010)

Publication Type: Journal article, Original article

Publication year: 2010

Journal

Advanced Materials Wiley-VCH Verlag

Original Authors: Pang S., Englert J.M., Tsao H.N., Hernandez Y., Hirsch A., Feng X., Mullen K.

Publisher: Wiley-VCH Verlag

Book Volume: 22

Pages Range: 5374-5377

Journal Issue: 47

DOI: 10.1002/adma.201002872

Abstract

An extrinsic corrugation-assisted mechanical exfoliation process is introduced to fabricate ultra-large, patterned monolayer graphene on silicon substrates. This exfoliation method, without any contamination, offers not only an ideal alternative for the scalable deposition of monolayer graphene on silicon substrates, but also provides a promising basis for the construction of graphene-based integrated circuits. Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Authors with CRIS profile

Jan Englert Lehrstuhl für Organische Chemie II Andreas Hirsch Lehrstuhl für Organische Chemie II

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials (EAM)

Involved external institutions

Max-Planck-Institut für Polymerforschung (MPI-P) / Max Planck Institute for Polymer Research DE Germany (DE)

How to cite

APA:

Pang, S., Englert, J., Tsao, H.N., Hernandez, Y., Hirsch, A., Feng, X., & Muellen, K. (2010). Extrinsic corrugation-assisted mechanical exfoliation of monolayer graphene. Advanced Materials, 22(47), 5374-5377. https://doi.org/10.1002/adma.201002872

MLA:

Pang, Shuping, et al. "Extrinsic corrugation-assisted mechanical exfoliation of monolayer graphene." Advanced Materials 22.47 (2010): 5374-5377.

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