Measurements with an atomic force microscope using a long travel nanopositioning and nanomeasuring machine
Hofmann N, Hausotte T, Jäger G, Manske E (2004)
Publication Status: Published
Publication Type: Conference contribution
Publication year: 2004
Pages Range: 183-185
Conference Proceedings Title: 4th IEEE Conference on Nanotechnology
Event location: München
ISBN: 0-7803-8536-5
DOI: 10.1109/NANO.2004.1392290
Abstract
A nanopositioning and -measuring machine (NMM) was developed at the Institute of Measurement and Sensor Technology. It offers a movement range of 25 mm x 25 mm x 5 mm with a resolution of 0.1 nm. To use the NMM as an instrument to measure micro- and nanostructures on small objects a commercial atomic force microscope (AFM) was integrated. A ULTRAObjective standard by Surface Imaging Systems Germany was used for this. Extensive measurements were carried out to test the metrological characteristics of the system. Different measuring modes showed a big influence on the achieved results.
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APA:
Hofmann, N., Hausotte, T., Jäger, G., & Manske, E. (2004). Measurements with an atomic force microscope using a long travel nanopositioning and nanomeasuring machine. In 4th IEEE Conference on Nanotechnology (pp. 183-185). München, DE.
MLA:
Hofmann, Norbert, et al. "Measurements with an atomic force microscope using a long travel nanopositioning and nanomeasuring machine." Proceedings of the 4th IEEE Conference on Nanotechnology, München 2004. 183-185.
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