Fauster T (2001)
Publication Status: Published
Publication Type: Journal article
Publication year: 2001
Publisher: American Institute of Physics (AIP)
Book Volume: 79
Pages Range: 1608-1610
DOI: 10.1063/1.1401788
A vicinal surface of silicon is found that exhibits an atomically accurate step pattern with a period of 5.73 nm, corresponding to 17 atomic rows per (111) terrace. It can be viewed as reconstructed Si(557) surface, where a triple step is combined with a single Si(111)7x7 unit. The driving forces for establishing regular step patterns are discussed. (C) 2001 American Institute of Physics.
APA:
Fauster, T. (2001). Atomically accurate Si grating with 5.73 nm period. Applied Physics Letters, 79, 1608-1610. https://doi.org/10.1063/1.1401788
MLA:
Fauster, Thomas. "Atomically accurate Si grating with 5.73 nm period." Applied Physics Letters 79 (2001): 1608-1610.
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