Atomically accurate Si grating with 5.73 nm period

Fauster T (2001)

Publication Status: Published

Publication Type: Journal article

Publication year: 2001


Publisher: American Institute of Physics (AIP)

Book Volume: 79

Pages Range: 1608-1610

DOI: 10.1063/1.1401788


A vicinal surface of silicon is found that exhibits an atomically accurate step pattern with a period of 5.73 nm, corresponding to 17 atomic rows per (111) terrace. It can be viewed as reconstructed Si(557) surface, where a triple step is combined with a single Si(111)7x7 unit. The driving forces for establishing regular step patterns are discussed. (C) 2001 American Institute of Physics.

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How to cite


Fauster, T. (2001). Atomically accurate Si grating with 5.73 nm period. Applied Physics Letters, 79, 1608-1610.


Fauster, Thomas. "Atomically accurate Si grating with 5.73 nm period." Applied Physics Letters 79 (2001): 1608-1610.

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