Molecular Layer Deposition from Dissolved Precursors

Fichtner J, Wu Y, Hitzenberger J, Drewello T, Bachmann J (2017)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2017

Journal

ECS Journal of Solid State Science and Technology Electrochemical Society

Publisher: ELECTROCHEMICAL SOC INC

Book Volume: 6

Pages Range: N171-N175

Journal Issue: 9

DOI: 10.1149/2.0291709jss

Abstract

We present a procedure for growing thin films of an organic polyamid material based on a cyclic repetition of two consecutive, complementary, self-limiting surface reactions. The molecular compounds that react with the surface are dissolved in an organic solvent. This new method exemplifies how atomic layer deposition (ALD) and molecular layer deposition (MLD) can benefit from being transferred from the gas phase to the liquid phase, given that a broad variety of advantageous reagents are only available in dissolved form. (c) The Author(s) 2017. Published by ECS. All rights reserved.

Authors with CRIS profile

Johannes Fichtner Lehrstuhl für Anorganische und Allgemeine Chemie Yanlin Wu Lehrstuhl für Anorganische und Allgemeine Chemie Jakob Hitzenberger Professur für Physikalische Chemie Thomas Drewello Professur für Physikalische Chemie Julien Bachmann Lehrstuhl für Chemistry of thin film materials

How to cite

APA:

Fichtner, J., Wu, Y., Hitzenberger, J., Drewello, T., & Bachmann, J. (2017). Molecular Layer Deposition from Dissolved Precursors. ECS Journal of Solid State Science and Technology, 6(9), N171-N175. https://doi.org/10.1149/2.0291709jss

MLA:

Fichtner, Johannes, et al. "Molecular Layer Deposition from Dissolved Precursors." ECS Journal of Solid State Science and Technology 6.9 (2017): N171-N175.

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