Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs
Schneider M, Fey D (2012)
Publication Type: Conference contribution
Publication year: 2012
Journal
Publisher: Springer-verlag
Edited Volumes: Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)
City/Town: Japan
Book Volume: 7439
Pages Range: 41-55
Conference Proceedings Title: Algorithms and Architectures for Parallel Processing
Event location: Fukuoka, Japan
ISBN: 978-3-642-33077-3
URI: http://link.springer.com/book/10.1007/978-3-642-33078-0/page/1
DOI: 10.1007/978-3-642-33078-0_4
Abstract
The e-beam lithography is used to provide high resolution circuit patterning for circuit fabrication processes. However, due to electron scattering in resist and substrate it occurs an undesired exposure of regions which are adjacent to the actual exposed regions. These proximity effects represent an essential limitation to the attainable lithographic resolution. Since these effects can be described mathematically, different approaches were investigated to simulate and correct them. The developed algorithms provide the required precision for printing of circuit patterns, but on the other side demand a tremendous computational power. Modern GPGPUs consist of hundreds of processing cores and provide the same computational power as a small cluster. Therefore, the required computational power of correction algorithms may be achieved using GPGPUs. In this paper, we evaluate the achievable performance for a short-range proximity effect correction algorithm using GPGPUs. © 2012 Springer-Verlag.
Authors with CRIS profile
Max Schneider
Lehrstuhl für Informatik 3 (Rechnerarchitektur)
Dietmar Fey
Lehrstuhl für Informatik 3 (Rechnerarchitektur)
How to cite
APA:
Schneider, M., & Fey, D. (2012). Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs. In Algorithms and Architectures for Parallel Processing (pp. 41-55). Fukuoka, Japan, JP: Japan: Springer-verlag.
MLA:
Schneider, Max, and Dietmar Fey. "Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs." Proceedings of the 12th International Conference on Algorithms and Architectures for Parallel Processing, Fukuoka, Japan Japan: Springer-verlag, 2012. 41-55.
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