Advanced thin film technology for ultrahigh resolution X-ray microscopy
Fink R, Raabe J, David C (2009)
Publication Type: Journal article, Original article
Publication year: 2009
Journal
Original Authors: Vila-Comamala J., Jefimovs K., Raabe J., Pilvi T., Fink R.H., Senoner M., Maassdorf A., Ritala M., David C.
Publisher: Elsevier
Book Volume: 109
Pages Range: 1360-1364
Journal Issue: 11
DOI: 10.1016/j.ultramic.2009.07.005
Abstract
Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10 nm in width were resolved. © 2009 Elsevier B.V. All rights reserved.
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Switzerland (CH)How to cite
APA:
Fink, R., Raabe, J., & David, C. (2009). Advanced thin film technology for ultrahigh resolution X-ray microscopy. Ultramicroscopy, 109(11), 1360-1364. https://doi.org/10.1016/j.ultramic.2009.07.005
MLA:
Fink, Rainer, Jörg Raabe, and Christian David. "Advanced thin film technology for ultrahigh resolution X-ray microscopy." Ultramicroscopy 109.11 (2009): 1360-1364.
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