A simple approach to atom probe sample preparation by using shadow masks

Felfer P, Mccarroll I, Macauley C, Cairney JM (2016)

Publication Status: Published

Publication Type: Journal article

Publication year: 2016

Journal

Ultramicroscopy Elsevier

Publisher: Elsevier

Book Volume: 160

Pages Range: 163-167

DOI: 10.1016/j.ultramic.2015.09.005

Abstract

Here, we present a new method that utilises shadow masks in a broad ion beam system to prepare atom probe samples. It is particularly suited to non-conductors and materials with surface layers such as surface oxides, implanted layers or thin films. This new approach bypasses the focused ion beam (FIB) lift-out step, increasing the sample throughput, dramatically reducing the required FIB beam time and decreasing the complexity of sample preparation. (C) 2015 Elsevier By. All rights reserved.

Authors with CRIS profile

Peter Felfer Professur für Atom Probe Tomography

Additional Organisation(s)

Interdisziplinäres Zentrum, Center for Nanoanalysis and Electron Microscopy (CENEM) Lehrstuhl für Werkstoffwissenschaften (Allgemeine Werkstoffeigenschaften)

Involved external institutions

University of California US United States (USA) (US) University of Sydney (USYD) AU Australia (AU)

How to cite

APA:

Felfer, P., Mccarroll, I., Macauley, C., & Cairney, J.M. (2016). A simple approach to atom probe sample preparation by using shadow masks. Ultramicroscopy, 160, 163-167. https://doi.org/10.1016/j.ultramic.2015.09.005

MLA:

Felfer, Peter, et al. "A simple approach to atom probe sample preparation by using shadow masks." Ultramicroscopy 160 (2016): 163-167.

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