Prof. Dr. Heiner Ryssel

Technische Fakultät

Photon assisted implantation (PAI) (1993) Biró L, Gyulai J, Ryssel H, Frey L, Kormány T, Tuan N, Horváth z Journal article, Original article High energy implantation of 10B and 11B into (100) silicon in channel and in random direction (1993) Bogen S, Gong L, Frey L, Ryssel H Journal article, Original article Effect of ion-beam mixing temperature on cobalt silicide formation (1993) Kasko I, Dehm C, Frey L, Ryssel H Journal article, Original article Contamination control and ultrasensitive chemical analysis (1993) Ryssel H, Frey L, Streckfuss N, Schork R, Kroninger F, Falter T Journal article, Original article Application of advanced contamination analysis for qualification of wafer handling systems and chucks (1993) Kroninger F, Streckfuss N, Frey L, Falter T, Ryzlewicz C, Pfitzner L, Ryssel H Journal article, Original article A novel delineation technique for 2D-profiling of dopants in crystalline silicon (1993) Gong L, Frey L, Bogen S, Ryssel H Journal article, Original article Analysis of microstructured samples by focused ion beam sample preparation (1993) Frey L, Ergele W, Falter T, Gong L, Ryssel H Journal article, Original article High energy ion implantation for semiconductor application at Fraunhofer-AIS, Erlangen (1992) Frey L, Bogen S, Gong L, Jung W, Ryssel H, Gyulai J Journal article, Original article Characterization of metal impurities in silicon-on-insulator material (1992) Frey L, Kroninger F, Streckfusse N, Ryssel H, Margail J Journal article, Original article Analysis of trace metals on silicon surfaces (1992) Streckfusse N, Frey L, Zielonka G, Kroninger F, Ryzlewicz C, Ryssel H Journal article, Original article