Dr. Johannes Will

Orcid ID:

0000-0003-0326-9913

List of publications:

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Lehrstuhl für Werkstoffwissenschaften (Mikro- und Nanostrukturforschung) Lehrstuhl für Kristallographie und Strukturphysik (ICSP)
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Types of publications

Journal article
Book chapter / Article in edited volumes
Authored book
Translation
Thesis
Edited Volume
Conference contribution
Other publication type
Unpublished / Preprint

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Abstract

Journal

Misfit strain of oxygen precipitates in Czochralski silicon studied with energy-dispersive X-ray diffraction (2014) Gröschel A, Will J, Bergmann C, Magerl A Journal article Diffusion-driven precipitate growth and ripening of oxygen precipitates in boron doped silicon by dynamical x-ray diffraction (2014) Will J, Gröschel A, Bergmann C, Spiecker E, Magerl A Journal article Nanoscale structure of Si/SiO2/organics interfaces (2014) Steinrück HG, Schiener A, Schindler T, Will J, Magerl A, Konovalov O, Li Destri G, et al. Journal article, Original article Oxygen diffusivity in silicon derived from dynamical X-ray diffraction (2013) Will J, Gröschel A, Kot D, Bergmann C, Steinrück HG, Schubert MA, Kissinger G, Magerl A Journal article, Original article In-situ measurement of thickness-dependent Pendellosung oscillations from a precipitation process in silicon at 650 degrees C (2012) Will J, Gröschel A, Bergmann C, Magerl A Conference contribution, Conference Contribution Thickness dependence of the integrated Bragg intensity for statistically disturbed silicon crystals (2011) Will J, Gröschel A, Weißer M, Magerl A Journal article Structural Defect Studies of Semiconductor Crystals with Laue Topography (2011) Gröschel A, Will J, Bergmann C, Grillenberger H, Eichler S, Scheffer-Czygan M, Magerl A Conference contribution, Conference Contribution In-Situ observation of the oxygen nucleation in silicon with X-Ray single crystal diffraction (2011) Will J, Gröschel A, Bergmann C, Magerl A Conference contribution
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