Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics

Research facility


Location: Halle, Germany (DE) DE

ISNI: 0000000404915558

ROR: https://ror.org/0095xwr23

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Types of publications

Journal article
Book chapter / Article in edited volumes
Authored book
Translation
Thesis
Edited Volume
Conference contribution
Other publication type
Unpublished / Preprint

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Abstract

Journal

Stoichiometry of Nickel Oxide Films Prepared by ALD (2011) Bachmann J, Zolotaryov A, Albrecht O, Goetze S, Berger A, Hesse D, Novikov D, Nielsch K Journal article, Original article Superparamagnetic behavior in cobalt iron oxide nanotube arrays by atomic layer deposition (2011) Chong YT, Yau MYE, Yang Y, Zacharias M, Goerlitz D, Nielsch K, Bachmann J Journal article, Original article Ferromagnetism and Morphology of Annealed Fe2O3/CoXOY/ZnO Thin Films (2011) Zolotaryov A, Goetze S, Bachmann J, Goerlitz D, Hesse D, Nielsch K Journal article, Original article The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition (2011) Hoeflich K, Yang RB, Berger A, Leuchs G, Christiansen S Journal article Direct Atomic Layer Deposition of Ternary Ferrites with Various Magnetic Properties (2010) Chong YT, Yau EMY, Nielsch K, Bachmann J Journal article, Original article Multi layered Core/Shell Nanowires Displaying Two Distinct Magnetic Switching Events (2010) Chong YT, Goerlitz D, Martens S, Yau MYE, Allende S, Bachmann J, Nielsch K Journal article, Original article The Transition between Conformal Atomic Layer Epitaxy and Nanowire Growth (2010) Yang RB, Zakharov N, Moutanabbir O, Scheerschmidt K, Wu LM, Goesele U, Bachmann J, Nielsch K Journal article, Original article Electrochemical route to thermoelectric nanowires via organic electrolytes (2010) Klammer J, Bachmann J, Toellner W, Bourgault D, Cagnon L, Goesele U, Nielsch K Journal article, Original article Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties (2010) Hiller D, Zierold R, Bachmann J, Alexe M, Yang Y, Gerlach JW, Stesmans A, et al. Journal article, Original article Stress and doping uniformity of laser crystallized amorphous silicon in thin film silicon solar cells (2010) Agaiby RMB, Becker M, Thapa SB, Urmoneit U, Berger A, Gawlik A, Sarau G, Christiansen SH Journal article
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