Lehrstuhl für Elektronische Bauelemente

Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing (2010) Jambreck JD, Schmitt H, Amon B, Rommel M, Bauer AJ, Frey L Journal article, Original article Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks (2010) Hinz J, Bauer AJ, Thiede T, Fischer RA, Frey L Journal article, Original article Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques (2010) Rommel M, Spoldi G, Yanev V, Beuer S, Amon B, Jambreck J, Petersen S, et al. Journal article, Original article Efficient Analysis of Three Dimensional EUV Mask Induced Imageing Artifacts Using the Waveguide Decomposition Method (2009) Shao F, Evanschitzky P, Fühner T, Erdmann A Conference contribution Polymer bonded soft magnetics for EMI filter applications (2009) Egelkraut S, Rauch M, Schletz A, Gardocki A, März M, Ryssel H Conference contribution Finite integration (FI) method for modeling optical wavers in lithography masks (2009) Erdmann A, Pflaum C, Rahimi Z Conference contribution, Conference Contribution A model of self-limiting residual acid diffusion for pattern doubling (2009) Erdmann A, Fuhrmann J, Fiebach A, Uhle M, Szmanda C, Truong C Journal article Rigorous diffraction simulations of topographic wafer stacks in double patterning (2009) Shao F, Evanschitzky P, Fühner T, Erdmann A Journal article Extraordinary low transmission effects for ultra-thin patterned metal films (2009) Reibold D, Shao F, Erdmann A, Peschel U Journal article Advanced lithography models for strict process control in the 32nm technology node (2009) Patsis GP, Drygiannakis D, Raptis T, Gogoliddes E, Erdmann A Journal article