Journal of Applied Physics
Journal Abbreviation: J APPL PHYS
ISSN: 0021-8979
eISSN: 1089-7550
Publisher: AIP Publishing
Publications (182)
High-mobility polymer gate dielectric pentacene thin film transistors (2002)
Klauk H, Halik M, Zschieschang U, Schmid G, Radlik W
Journal article
Growth and electrical transport of germanium nanowires (2001)
Gu G, Burghard M, Kim G, Duesberg GS, Chiu P, Krstic V, Roth S, Han W
Journal article, Original article
Simulation of Trench Homogeneity in Plasma Immersion IonImplantation (2001)
Keller G, Stals L, Mändl S, Rauschenbach B, Rüde U
Journal article
The role of hydrogen for field emission from chemical vapour deposited diamond and nanocrystaline diamond powder (2000)
Ley L, Ristein J, Stammler M
Journal article
Two-dimensional simulation of plasma-based ion-implantation (1999)
Paulus M, Stals L, Rauschenbach B, Rüde U
Journal article
Band discontinuities and local interface composition in BeTe/ZnSe heterostructures (1998)
Nagelstraßer M, Dröge H, Fischer F, Litz T, Waag A, Landwehr G, Steinrück HP
Journal article, Original article
A comparative analysis of a-C:H by infrared spectroscopy and mass selected thermal effusion (1998)
Ristein J, Ley L
Journal article, Review article
Non contact temperature measurements of diamond by Raman spectroscopy (1998)
Ristein J, Ley L
Journal article
Growth of diamond on silicon during the bias pretreatment in chemically vapour deposition of polycristalline diamond films (1996)
Ristein J, Hundhausen M, Ley L
Journal article
Influence of light on individual defect noise in a-Si:H/a-SiNx:H double barrier structures (1994)
Hundhausen M, Ley L
Journal article