Journal of Applied Physics

Journal Abbreviation: J APPL PHYS
ISSN: 0021-8979
eISSN: 1089-7550
Publisher: AIP Publishing

Publications (185)

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Unpublished / Preprint

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Abstract

Time-resolved x-ray diffraction study of laser-induced shock and acoustic waves in single crystalline silicon (2009) Liss KD, D'Almeida T, Kaiser M, Hock R, Magerl A, Eloy JF Journal article Size effects in ordered arrays of magnetic nanotubes: Pick your reversal mode (2009) Bachmann J, Escrig J, Pitzschel K, Montero Moreno JM, Jing J, Goerlitz D, Altbir D, Nielsch K Journal article On the lattice parameters of silicon carbide (2009) Stockmeier M, Müller R, Sakwe A, Wellmann P, Magerl A Journal article Highly p-doped regions in silicon solar cells quantitatively analyzed by small angle beveling and micro-Raman spectroscopy (2009) Becker M, Goesele U, Hofmann A, Christiansen S Journal article Analytical formulation for the resonant frequency of split rings (2009) Sydoruk O, Tatartschuk E, Shamonina E, Solymar L Journal article Slow waves on magnetic metamaterials and on chains of plasmonic nanoparticles: Driven solutions in the presence of retardation (2009) Zhuromskyy O, Sydoruk O, Shamonina E, Solymar L Journal article Radiation stability of CsBr:Eu needle image plates (2009) Batentschuk M, Neudert S, Weidner M, Osvet A, Struye L, Tahon JP, Leblans P Journal article, Original article Creation of storage centers in CsBr: Eu2+ needle image plates by vacuum ultraviolet radiation (2009) Weidner M, Batentschuk M, Osvet A, Winnacker A, Tahon JP, Leblans P Journal article, Original article Interface screening and imprint in poly(vinylidene fluoride/ trifluoroethylene) ferroelectric field effect transistors (2009) Koval Y, Lazareva I, Müller P, Müller K, Schmeisser D Journal article, Original article Detailed arsenic concentration profiles at Si/SiO2 interfaces (2008) Pei L, Duscher G, Steen C, Pichler P, Ryssel H, Napolitani E, De Salvador D, et al. Journal article, Original article