Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
ISSN: 0734-211X
Publisher: American Institute of Physics
Publications (7)
Analysis of the effect of germanium preamorphization on interface defects and leakage current for high-k metal-oxide-semiconductor field-effect transistor (2011)
Roll G, Jakschik S, Goldbach M, Wachowiak A, Mikolajick T, Frey L
Journal article, Original article
Gate oxide reliability at the nanoscale evaluated by combining conductive atomic force microscopy and constant voltage stress (2011)
Erlbacher T, Yanev VC, Rommel M, Bauer A, Frey L
Journal article
Characterization of thickness variations of thin dielectric layers at the nanoscale using scanning capacitance microscopy (2011)
Yanev V, Rommel M, Bauer AJ, Frey L
Journal article, Original article
Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques (2010)
Rommel M, Spoldi G, Yanev V, Beuer S, Amon B, Jambreck J, Petersen S, et al.
Journal article, Original article
Kinetics of field induced oxidation of hydrogen terminated Si(111) by means of a scanning force micoscope (1996)
Ley L, Hundhausen M
Journal article
Nanometer-scale modification of the tribological properties of Si(111):H surfaces performed and investigated by a conducting-probe scanning force microscope (1996)
Hundhausen M, Ley L
Journal article
Cross-Sectional Scanning Tunneling and Scanning Force Microscopy of Amorphous Hydrogenated Silicon pn-Doping-Superlattices in Nitrogen and Air (1994)
Hundhausen M, Ley L
Journal article