Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing (2010) Jambreck JD, Schmitt H, Amon B, Rommel M, Bauer AJ, Frey L Journal article, Original article A model of self-limiting residual acid diffusion for pattern doubling (2009) Erdmann A, Fuhrmann J, Fiebach A, Uhle M, Szmanda C, Truong C Journal article Rigorous diffraction simulations of topographic wafer stacks in double patterning (2009) Shao F, Evanschitzky P, Fühner T, Erdmann A Journal article Advanced lithography models for strict process control in the 32nm technology node (2009) Patsis GP, Drygiannakis D, Raptis T, Gogoliddes E, Erdmann A Journal article Lanthanum implantation for threshold voltage control in metal/high-k devices (2009) Fet A, Haeublein V, Bauer AJ, Ryssel H, Frey L Journal article, Original article Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale (2009) Yanev V, Erlbacher T, Rommel M, Bauer AJ, Frey L Journal article, Original article Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition (2009) Mueller J, Boescke TS, Schroeder U, Reinicke M, Oberbeck L, Zhou D, Weinreich W, et al. Journal article, Original article Simulation of ion beam direct structuring for 3D nanoimprint template fabrication (2006) Lugstein A, Frey L, Bertagnolli E, Platzgummer E, Biedermann A, Langfischer H, Eder-Kapl S, et al. Journal article, Original article Characterization of interface state densitiesby photocurrent analysis: Comparison of results for different insulator layers (2005) Rommel M, Groß M, Ettinger A, Lemberger M, Bauer A, Frey L, Ryssel H Journal article, Original article Electrical characterization and reliability aspects of zirconium silicate films obtained from novel MOCVD precursors (2004) Lemberger M, Paskaleva A, Zürcher S, Bauer A, Frey L, Ryssel H Journal article, Original article