The Metrological Basis and Operation of Nanopositioning and Nanomeasuring Machine NMM-1
Jäger G, Manske E, Hausotte T, Büchner HJ (2009)
Publication Status: Published
Publication Type: Journal article
Publication year: 2009
Journal
Publisher: Oldenbourg Verlag
Book Volume: 76
Pages Range: 227-234
Abstract
After an explanation of the set-up of a nanomeasuring machine NMM-1, its high performance is described with a metrological analysis. This analysis shows some of today's limits of nanopositioning and nanomeasuring engineering. Single, double and triple beam plane mirror interferometers are applied in the nanomeasuring machine in order to measure and control the six degrees of freedom of the 3D nanopositioning stage. The various applications of the nanomeasuring machine are based on the installation of optical and tactile nanoprobes above the 3D nanopositioning stage. The set-up, function and measurement results of some zero-point nanoprobes in combination with the nanomeasuring machine are explained.
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Germany (DE)How to cite
APA:
Jäger, G., Manske, E., Hausotte, T., & Büchner, H.-J. (2009). The Metrological Basis and Operation of Nanopositioning and Nanomeasuring Machine NMM-1. Technisches Messen, 76, 227-234. https://doi.org/10.1524/teme.2009.0960
MLA:
Jäger, Gerd, et al. "The Metrological Basis and Operation of Nanopositioning and Nanomeasuring Machine NMM-1." Technisches Messen 76 (2009): 227-234.
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