Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene

Richter N, Hernandez YR, Schweitzer S, Kim JS, Patra AK, Englert J, Lieberwirth I, Liscio A, Palermo V, Feng X, Hirsch A, Muellen K, Klaeui M (2017)


Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2017

Journal

Publisher: American Physical Society

Book Volume: 7

Article Number: 024022

Journal Issue: 2

DOI: 10.1103/PhysRevApplied.7.024022

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How to cite

APA:

Richter, N., Hernandez, Y.R., Schweitzer, S., Kim, J.-S., Patra, A.K., Englert, J.,... Klaeui, M. (2017). Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene. Physical Review Applied, 7(2). https://dx.doi.org/10.1103/PhysRevApplied.7.024022

MLA:

Richter, Nils, et al. "Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene." Physical Review Applied 7.2 (2017).

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