Journal article


Patterning and visualizing self-assembled monolayers with low-energy electrons


Publication Details
Author(s): Krupke R, Malik S, Weber HB, Hampe O, Kappes M, von Löhneysen H
Journal: Nano Letters
Publisher: AMER CHEMICAL SOC
Publication year: 2002
Volume: 2
Journal issue: 10
Pages range: 1161-1164
ISSN: 1530-6984

Abstract

We show that a trimethylsilyl (TMS) self-assembled monolayer on a silicon surface is a self-developing positive resist, which can be patterned with low energy electrons. Contact angle measurements have been used to quantify the efficiency of the exposure as a function of exposure dose and acceleration voltage. Ash formation was negligible, as a 3-aminopropyltriethoxysilane (APTES) self-assembled monolayer could be formed on the patterned area without an intermediate development stage. APTES/TMS patterns have been visualized with scanning electron microscopy at low energy and atomic force microscopy. The functionality of the patterns has been tested by selective deposition of carbon nanotubes.



How to cite
APA: Krupke, R., Malik, S., Weber, H.B., Hampe, O., Kappes, M., & von Löhneysen, H. (2002). Patterning and visualizing self-assembled monolayers with low-energy electrons. Nano Letters, 2(10), 1161-1164. https://dx.doi.org/10.1021/nl025679e

MLA: Krupke, Ralph, et al. "Patterning and visualizing self-assembled monolayers with low-energy electrons." Nano Letters 2.10 (2002): 1161-1164.

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