Laser structuring of crystalline silicon thin-film solar cells on opaque foreign substrates

Kunz T, Gazuz V, Hessmann MT, Gawehns N, Burkert I, Brabec C (2011)

Publication Language: English

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2011

Journal

Solar Energy Materials and Solar Cells Elsevier

Book Volume: 95

Pages Range: 2454-2458

Journal Issue: 8

DOI: 10.1016/j.solmat.2011.04.031

Abstract

Crystalline silicon thin-film solar cells were fabricated on graphite substrates. A laser ablation process was developed for edge isolation of the thin-film cells. The shunt resistance was comparable to otherwise identical cells isolated by plasma etching, while the reproducibility of the laser isolation process was higher. The solar cells were characterized by currentvoltage and light beam induced current measurements (LBiC). No interference was detected along the ablated edges. Spatial variations of the minority carrier lifetime are attributed to the grain structure of the seeding layer obtained by the zone melting recrystallization (ZMR). © 2011 Elsevier B.V.

Authors with CRIS profile

Christoph Brabec Institute Materials for Electronics and Energy Technology (i-MEET)

Involved external institutions

Bayerisches Zentrum für Angewandte Energieforschung e.V. (ZAE Bayern) DE Germany (DE)

How to cite

APA:

Kunz, T., Gazuz, V., Hessmann, M.T., Gawehns, N., Burkert, I., & Brabec, C. (2011). Laser structuring of crystalline silicon thin-film solar cells on opaque foreign substrates. Solar Energy Materials and Solar Cells, 95(8), 2454-2458. https://dx.doi.org/10.1016/j.solmat.2011.04.031

MLA:

Kunz, T., et al. "Laser structuring of crystalline silicon thin-film solar cells on opaque foreign substrates." Solar Energy Materials and Solar Cells 95.8 (2011): 2454-2458.

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