Chemical stability of carbon-based inorganic materials for in situ x-ray investigations of ammonothermal crystal growth of nitrides

Schimmel S, Künecke U, Meisel M, Hertweck B, Steigerwald T, Nebel C, Alt N, Schlücker E, Wellmann P (2016)

Publication Language: English

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2016

Journal

Journal of Crystal Growth Elsevier

Publisher: Elsevier

Book Volume: 456

Pages Range: 33-42

DOI: 10.1016/j.jcrysgro.2016.08.067

Abstract

The chemical stability of diamond, silicon carbide, vitreous carbon, and boron carbide in supercritical ammonia containing different mineralizers was investigated. The materials were found to show good corrosion resistance in the presence of selective or all tested mineralizers.Diamond was found to be virtually inert in both ammonoacidic and ammonobasic reaction media.Silicon carbide showed good chemical stability in varying ammonothermal reaction media.The chemical stability of vitreous carbon was found to depend on its manufacturing temperature.Corrosion of boron carbide strongly depends on the mineralizer used as well as on applied mechanical stress.Based on their chemical stability and mechanical properties, the applicability of the materials in the respective ammonothermal reaction media as construction materials is evaluated. Additionally, the applicability of the materials as a window material for both high energy . in situ x-ray imaging and low energy . in situ x-ray diffraction is discussed.

Authors with CRIS profile

Saskia Schimmel Professur für Werkstoffwissenschaften (Werkstoffe der Elektrotechnik) Ulrike Künecke Professur für Werkstoffwissenschaften (Werkstoffe der Elektrotechnik) Benjamin Hertweck Lehrstuhl für Prozessmaschinen und Anlagentechnik Thomas Steigerwald Lehrstuhl für Prozessmaschinen und Anlagentechnik Nicolas Alt Lehrstuhl für Prozessmaschinen und Anlagentechnik Eberhard Schlücker Lehrstuhl für Prozessmaschinen und Anlagentechnik Peter Wellmann Professur für Werkstoffwissenschaften (Werkstoffe der Elektrotechnik)

Involved external institutions

Fraunhofer-Institut für Angewandte Festkörperphysik (IAF) / Fraunhofer Institute for Applied Solid State Physics DE Germany (DE)

How to cite

APA:

Schimmel, S., Künecke, U., Meisel, M., Hertweck, B., Steigerwald, T., Nebel, C.,... Wellmann, P. (2016). Chemical stability of carbon-based inorganic materials for in situ x-ray investigations of ammonothermal crystal growth of nitrides. Journal of Crystal Growth, 456, 33-42. https://dx.doi.org/10.1016/j.jcrysgro.2016.08.067

MLA:

Schimmel, Saskia, et al. "Chemical stability of carbon-based inorganic materials for in situ x-ray investigations of ammonothermal crystal growth of nitrides." Journal of Crystal Growth 456 (2016): 33-42.

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