Nanopositioning and Nanomeasuring Machine NPMM-200 – sub-nanometre resolution and highest accuracy in extended macroscopic working areas

Manske E, Jäger G, Hausotte T, Müller A, Balzer F (2017)


Publication Language: English

Publication Type: Conference contribution, Conference Contribution

Publication year: 2017

Event location: Hannover DE

Abstract

At the Technische Universität Ilmenau, a new Nanopositioning and Nanomeasuring Machine NPMM 200 with a measuring range of 200 mm × 200 mm × 25 mm and a resolution of 0.02 nm has been developed. In order to achieve both highest nanometre accuracy and largest three-dimensional working space, an extended three-dimensional Abbe comparator principle is applied. The object to be measured is placed on a special mirror plate whose position in all six degrees of freedom is measured by high-precision multi-axis fibre-coupled laser interferometers. By means of an advanced closed-loop control tilt errors induced by the guiding systems can be minimized up to interferometric level. This paper presents the metrological concept, the realized design, the conditioning of environmental parameters as well as some first measuring results.

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How to cite

APA:

Manske, E., Jäger, G., Hausotte, T., Müller, A., & Balzer, F. (2017). Nanopositioning and Nanomeasuring Machine NPMM-200 – sub-nanometre resolution and highest accuracy in extended macroscopic working areas. In Proceedings of the euspen’s 17th International Conference & Exhibition. Hannover, DE.

MLA:

Manske, Eberhard, et al. "Nanopositioning and Nanomeasuring Machine NPMM-200 – sub-nanometre resolution and highest accuracy in extended macroscopic working areas." Proceedings of the euspen’s 17th International Conference & Exhibition, Hannover 2017.

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