Conference contribution
(Original article)


Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation


Publication Details
Author(s): Strauß J, Baum M, Alexeev I, Schmidt M
Publication year: 2015
Event: International Congress on Laser Advanced Materials Processing
Event location: Japan
Language: English

Abstract

In this publication we present a novel setup for Optical Trap Assisted Nanopatterning (OTAN) technology. The setup allows for parallelization and thus for higher throughput in this inventive and flexible direct-nanopatterning technology. In addition we present first results of parallel nanoscale structuring. We determine the stiffness of optical traps and compare the result to previous results of single OTAN. Furthermore we estimate the increase of throughput for the parallelized approach with respect to the conventional system.



Focus Area of Individual Faculties


How to cite
APA: Strauß, J., Baum, M., Alexeev, I., & Schmidt, M. (2015). Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation. Japan, JP.

MLA: Strauß, Johannes, et al. "Optical Trap Assisted Nanopatterning: Process Parallelisation and Dynamic Structure Generation." Proceedings of the International Congress on Laser Advanced Materials Processing, Japan 2015.

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