Muthumbi AK (2022)
Publication Language: English
Publication Type: Thesis
Publication year: 2022
Nanoimprint lithography is a mechanical based patterning technique where mold with
patterns are imprinted into photoresist. Nanoimprint molds considered in this work have
patterns of size 2-3 μm in diameter. During printing, misalignments and impurities in
the mold cause defects in the photoresist. Such defects are undesired and need to be
identified. A microscope with high numerical aperture objective lens is often used to image
the samples, though this leads to smaller field of views compared to low numerical aperture
lenses. Several unique fields of view are therefore required to image the entire sample. This
process is time consuming and can be prone to errors even when a mechanized scanner
is used. Computational imaging techniques can aid in reducing the tradeoff between
resolution and field of view. producing images with better quality. Algorithms are then
used to look for defects in the enhanced images. Advent of deep learning in the past
decade has led to algorithms that are much faster and more accurate than humans and
other algorithms at image analysis tasks. This has led to inclusion of deep learning in
APA:
Muthumbi, A.K. (2022). Defect detection in nano-imprint stamps with deep learning and low resolution microscope (Master thesis).
MLA:
Muthumbi, Alex Kariuki. Defect detection in nano-imprint stamps with deep learning and low resolution microscope. Master thesis, 2022.
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