Solution Atomic Layer Deposition of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films

Barr M, Nadiri S, Chen DH, Weidler PG, Bochmann S, Baumgart H, Bachmann J, Redel E (2022)

Publication Type: Journal article

Publication year: 2022

Journal

Chemistry of Materials American Chemical Society

DOI: 10.1021/acs.chemmater.2c01102

Abstract

For the first time, a procedure has been established for the growth of surface-anchored metal-organic framework (SURMOF) copper(II) benzene-1,4-dicarboxylate (Cu-BDC) thin films of thickness control with single molecule accuracy. For this, we exploit the novel method solution atomic layer deposition (sALD). The sALD growth rate has been determined at 4.5 Å per cycle. The compact and dense SURMOF films grown at room temperature by sALD possess a vastly superior film thickness uniformity than those deposited by conventional solution-based techniques, such as dipping and spraying while featuring clear crystallinity from 100 nm thickness. The highly controlled layer-by-layer growth mechanism of sALD proves crucial to prevent unwanted side reactions such as Ostwald ripening or detrimental island growth, ensuring continuous Cu-BDC film coverage. This successful demonstration of sALD-grown compact continuous Cu-BDC SURMOF films is a paradigm change and provides a key advancement enabling a multitude of applications that require continuous and ultrathin coatings while maintaining tight film thickness specifications, which were previously unattainable with conventional solution-based growth methods.

Authors with CRIS profile

Maissa Barr Lehrstuhl für Chemistry of thin film materials Soheila Nadiri Lehrstuhl für Chemistry of thin film materials Sebastian Bochmann Lehrstuhl für Chemistry of thin film materials Julien Bachmann Lehrstuhl für Chemistry of thin film materials

Involved external institutions

Karlsruhe Institute of Technology (KIT) DE Germany (DE) Old Dominion University US United States (USA) (US)

How to cite

APA:

Barr, M., Nadiri, S., Chen, D.H., Weidler, P.G., Bochmann, S., Baumgart, H.,... Redel, E. (2022). Solution Atomic Layer Deposition of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films. Chemistry of Materials. https://doi.org/10.1021/acs.chemmater.2c01102

MLA:

Barr, Maissa, et al. "Solution Atomic Layer Deposition of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films." Chemistry of Materials (2022).

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