Femtosecond Laser Assisted 3D Etching Using Inorganic-Organic Etchant
Butkute A, Merkininkaite G, Jurksas T, Stancikas J, Baravykas T, Vargalis R, Tickunas T, Bachmann J, Sakirzanovas S, Sirutkaitis V, Jonusauskas L (2022)
Publication Type: Journal article
Publication year: 2022
Journal
Book Volume: 15
Journal Issue: 8
DOI: 10.3390/ma15082817
Abstract
Selective laser etching (SLE) is a technique that allows the fabrication of arbitrarily shaped glass micro-objects. In this work, we show how the capabilities of this technology can be improved in terms of selectivity and etch rate by applying an etchant solution based on a Potassium Hydroxide, water, and isopropanol mixture. By varying the concentrations of these constituents, the wetting properties, as well as the chemical reaction of fused silica etching, can be changed, allowing us to achieve etching rates in modified fused silica up to 820 mu m/h and selectivity up to similar to 3000. This is used to produce a high aspect ratio (up to 1:1000), straight and spiral microfluidic channels which are embedded inside a volume of glass. Complex 3D glass micro-structures are also demonstrated.
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Lithuania (LT)How to cite
APA:
Butkute, A., Merkininkaite, G., Jurksas, T., Stancikas, J., Baravykas, T., Vargalis, R.,... Jonusauskas, L. (2022). Femtosecond Laser Assisted 3D Etching Using Inorganic-Organic Etchant. Materials, 15(8). https://doi.org/10.3390/ma15082817
MLA:
Butkute, Agne, et al. "Femtosecond Laser Assisted 3D Etching Using Inorganic-Organic Etchant." Materials 15.8 (2022).
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