Prospects for electron beam aberration correction using sculpted phase masks
Shiloh R, Remez R, Arie A (2016)
Publication Type: Journal article
Publication year: 2016
Journal
Book Volume: 163
Pages Range: 69-74
DOI: 10.1016/j.ultramic.2016.02.002
Abstract
Technological advances in fabrication methods allowed the microscopy community to take incremental steps towards perfecting the electron microscope, and magnetic lens design in particular. Still, state of the art aberration-corrected microscopes are yet 20-30 times shy of the theoretical electron diffraction limit. Moreover, these microscopes consume significant physical space and are very expensive. Here, we show how a thin, sculpted membrane is used as a phase-mask to induce specific aberrations into an electron beam probe in a standard high resolution TEM. In particular, we experimentally demonstrate beam splitting, two-fold astigmatism, three-fold astigmatism, and spherical aberration.
Authors with CRIS profile
Involved external institutions
Israel (IL)How to cite
APA:
Shiloh, R., Remez, R., & Arie, A. (2016). Prospects for electron beam aberration correction using sculpted phase masks. Ultramicroscopy, 163, 69-74. https://dx.doi.org/10.1016/j.ultramic.2016.02.002
MLA:
Shiloh, Roy, Roei Remez, and Ady Arie. "Prospects for electron beam aberration correction using sculpted phase masks." Ultramicroscopy 163 (2016): 69-74.
BibTeX: Download