Nanolithographic Top-Down Patterning of Polyoxovanadate-based Nanostructures with Switchable Electrical Resistivity

Rösner B, Fallica R, Johnson M, Späth A, Fink R, Ekinci Y, David C, Anjass MH, Streb C (2020)

Publication Type: Journal article

Publication year: 2020

Journal

ChemNanoMat Wiley

DOI: 10.1002/cnma.202000425

Abstract

The top-down lithographic fabrication of functional metal oxide nanostructures enables technologically important applications such as catalysis and electronics. Here, we report the use of molecular vanadium oxides, polyoxovanadates, as molecular precursors for electron beam lithography to obtain functional vanadium oxide nanostructures. The new resist class described gives access to nanostructures with minimum dimensions close to 10 nm. The lithographically prepared structures exhibit temperature-dependent switching behaviour of their electrical resistivity. The work could lay the foundation for accessing functional vanadium oxide nanostructures in the sub-10-nm domain using industrially established nanolithographic methods.

Authors with CRIS profile

Manuel Johnson Lehrstuhl für Physikalische Chemie II Andreas Späth Lehrstuhl für Physikalische Chemie II Rainer Fink Professur für Physikalische Chemie

Involved external institutions

Paul Scherrer Institute (PSI) CH Switzerland (CH) Universität Ulm DE Germany (DE)

How to cite

APA:

Rösner, B., Fallica, R., Johnson, M., Späth, A., Fink, R., Ekinci, Y.,... Streb, C. (2020). Nanolithographic Top-Down Patterning of Polyoxovanadate-based Nanostructures with Switchable Electrical Resistivity. ChemNanoMat. https://dx.doi.org/10.1002/cnma.202000425

MLA:

Rösner, Benedikt, et al. "Nanolithographic Top-Down Patterning of Polyoxovanadate-based Nanostructures with Switchable Electrical Resistivity." ChemNanoMat (2020).

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