Nonlinear absorption dynamics simulated in internal modification of glass at 532nm and 1064nm by ultrashort laser pulses

Miyamoto I, Cvecek K, Schmidt M (2018)

Publication Type: Conference contribution

Publication year: 2018

Journal

Procedia CIRP Curran

Publisher: Elsevier B.V.

Book Volume: 74

Pages Range: 344-348

Conference Proceedings Title: Procedia CIRP

Event location: Furth DE

DOI: 10.1016/j.procir.2018.08.129

Abstract

Dynamic ionization process at high pulse repetition rate is analysed based on the model consisting of rate equation for free-electrons, Gaussian beam propagation equation, thermal conduction and thermal ionization, showing the plasma generated near the geometrical focus moves toward the laser source periodically by the contribution of avalanche ionization. The effects of laser wavelength on the ionization process are discussed by comparing the contributions of multiphoton ionization and avalanche ionization. The crack tendency of 532nm and 1064nm is also compared between single pulse and multipulse irradiation.

Authors with CRIS profile

Kristian Cvecek Lehrstuhl für Photonische Technologien Michael Schmidt Lehrstuhl für Photonische Technologien

Involved external institutions

Osaka University JP Japan (JP)

How to cite

APA:

Miyamoto, I., Cvecek, K., & Schmidt, M. (2018). Nonlinear absorption dynamics simulated in internal modification of glass at 532nm and 1064nm by ultrashort laser pulses. In Michael Schmidt (Eds.), Procedia CIRP (pp. 344-348). Furth, DE: Elsevier B.V..

MLA:

Miyamoto, Isamu, Kristian Cvecek, and Michael Schmidt. "Nonlinear absorption dynamics simulated in internal modification of glass at 532nm and 1064nm by ultrashort laser pulses." Proceedings of the 10th CIRP Conference on Photonic Technologies, LANE 2018, Furth Ed. Michael Schmidt, Elsevier B.V., 2018. 344-348.

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