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Modelling the deep drawing of process optimized blanks

Vollertsen F, Hofmann A (2000)

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Publication Type: Conference contribution

Publication year: 2000

Publisher: IDDRG

Pages Range: 67-76

Conference Proceedings Title: Proceedings of the 20th Biennal IDDRG Congress

Event location: Genval

Additional Organisation(s)

How to cite

APA:

Vollertsen, F., & Hofmann, A. (2000). Modelling the deep drawing of process optimized blanks. In Proceedings of the 20th Biennal IDDRG Congress (pp. 67-76). Genval: IDDRG.

MLA:

Vollertsen, Frank, and Achim Hofmann. "Modelling the deep drawing of process optimized blanks." Proceedings of the Proceedings of the 20th Biennal IDDRG Congress, Genval IDDRG, 2000. 67-76.

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