Eßer G, Roth S (1998)
Publication Type: Conference contribution
Publication year: 1998
Publisher: Meisenbach Verlag
Pages Range: 217-226
Conference Proceedings Title: 3rd International Conference on Molded Interface Devices MID 98
Event location: Bamberg
APA:
Eßer, G., & Roth, S. (1998). Laser Exposure of Photoresists and their Application in the Manufacturing of MIDs. In Feldmann, K.; Pöhlau, F.; Römer, M.; Zippmann, V. (Eds.), 3rd International Conference on Molded Interface Devices MID 98 (pp. 217-226). Bamberg: Meisenbach Verlag.
MLA:
Eßer, Gerd, and Stephan Roth. "Laser Exposure of Photoresists and their Application in the Manufacturing of MIDs." Proceedings of the 3rd International Conference on Molded Interface Devices MID 98, Bamberg Ed. Feldmann, K.; Pöhlau, F.; Römer, M.; Zippmann, V., Meisenbach Verlag, 1998. 217-226.
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