Laser Exposure of Photoresists and their Application in the Manufacturing of MIDs

Eßer G, Roth S (1998)


Publication Type: Conference contribution

Publication year: 1998

Publisher: Meisenbach Verlag

Pages Range: 217-226

Conference Proceedings Title: 3rd International Conference on Molded Interface Devices MID 98

Event location: Bamberg

Additional Organisation(s)

How to cite

APA:

Eßer, G., & Roth, S. (1998). Laser Exposure of Photoresists and their Application in the Manufacturing of MIDs. In Feldmann, K.; Pöhlau, F.; Römer, M.; Zippmann, V. (Eds.), 3rd International Conference on Molded Interface Devices MID 98 (pp. 217-226). Bamberg: Meisenbach Verlag.

MLA:

Eßer, Gerd, and Stephan Roth. "Laser Exposure of Photoresists and their Application in the Manufacturing of MIDs." Proceedings of the 3rd International Conference on Molded Interface Devices MID 98, Bamberg Ed. Feldmann, K.; Pöhlau, F.; Römer, M.; Zippmann, V., Meisenbach Verlag, 1998. 217-226.

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