Application of a modified ICP-Algorithm in Manufacturing Technology

Hutterer A, Hagenah H, Otto A (2003)

Publication Type: Conference contribution

Publication year: 2003

Publisher: IOS Press

Pages Range: 127-134

Conference Proceedings Title: 8th International Fall Workshop

Event location: Amsterdam NL

Authors with CRIS profile

Hinnerk Hagenah Institute of Manufacturing Technology

Additional Organisation(s)

Institute of Manufacturing Technology

Involved external institutions

Technische Universität Wien / Vienna University of Technology AT Austria (AT)

How to cite

APA:

Hutterer, A., Hagenah, H., & Otto, A. (2003). Application of a modified ICP-Algorithm in Manufacturing Technology. In Ertl, T.; Girod, B.; Greiner, G.; Niemann, H.; Seidel, H. (Eds.), 8th International Fall Workshop (pp. 127-134). Amsterdam, NL: IOS Press.

MLA:

Hutterer, Angelika, Hinnerk Hagenah, and Andreas Otto. "Application of a modified ICP-Algorithm in Manufacturing Technology." Proceedings of the 8th International Fall Workshop, Amsterdam Ed. Ertl, T.; Girod, B.; Greiner, G.; Niemann, H.; Seidel, H., IOS Press, 2003. 127-134.

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