Microanalysis of impurity contamination in masklessly etched area using focused ion beam

Park Y, Takai M, Nagai T, Kishimoto T, Lehrer C, Frey L, Ryssel H (1997)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 1997

Journal

Japanese Journal of Applied Physics Japan Society of Applied Physics

Book Volume: 36

Pages Range: 7712-7716

URI: https://www.scopus.com/record/display.uri?eid=2-s2.0-0031346547&origin=inward

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente Heiner Ryssel Technische Fakultät

Involved external institutions

Osaka University JP Japan (JP)

How to cite

APA:

Park, Y., Takai, M., Nagai, T., Kishimoto, T., Lehrer, C., Frey, L., & Ryssel, H. (1997). Microanalysis of impurity contamination in masklessly etched area using focused ion beam. Japanese Journal of Applied Physics, 36, 7712-7716.

MLA:

Park, Y., et al. "Microanalysis of impurity contamination in masklessly etched area using focused ion beam." Japanese Journal of Applied Physics 36 (1997): 7712-7716.

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