Aspects of a novel method for the pore size analysis of thin silica films based on krypton adsorption at liquid argon temperature (87.3 K).

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Details zur Publikation

Autorinnen und Autoren: Thommes M
Zeitschrift: Studies in Surface Science and Catalysis
Verlag: Elsevier B.V.
Jahr der Veröffentlichung: 2007
Band: 165
Heftnummer: Recent Progress in Mesostructured Materials
Seitenbereich: 551-554-554
ISSN: 0167-2991


Abstract

The adsorption and phase behavior of Kr at 87.3 K (i.e. 28.5 K below Kr triple point temp.) was systematically studied as a function of pore size by a series of micro- and mesoporous mol. sieves. Pore condensation of Kr cannot be obsd. for pore diams. > 10 nm, but occurs in smaller mesopores. An important result is further that the d. of the confined Kr phase at 87.3 K corresponds to the d. of supercooled liq. Kr, which is important for applying Kr adsorption for pore size anal. We used the results of our systematic Kr adsorption studies to develop a method for the characterization of thin micro/mesoporous SiO2 films based on Kr adsorption at liq. Ar temp. (87.3 K). This method allows detg. the pore size distribution of thin films in the pore diam. range from < 1 to ∼ 9 nm. [on SciFinder(R)]


FAU-Autorinnen und Autoren / FAU-Herausgeberinnen und Herausgeber

Thommes, Matthias Prof. Dr.
Lehrstuhl für Thermische Verfahrenstechnik

Zuletzt aktualisiert 2019-27-02 um 20:53