Aspects of a novel method for the pore size analysis of thin silica films based on krypton adsorption at liquid argon temperature (87.3 K).

Thommes M (2007)


Publication Type: Journal article, Original article

Subtype: other

Publication year: 2007

Journal

Publisher: Elsevier B.V.

Book Volume: 165

Pages Range: 551-554-554

Journal Issue: Recent Progress in Mesostructured Materials

Abstract

The adsorption and phase behavior of Kr at 87.3 K (i.e. 28.5 K below Kr triple point temp.) was systematically studied as a function of pore size by a series of micro- and mesoporous mol. sieves. Pore condensation of Kr cannot be obsd. for pore diams. > 10 nm, but occurs in smaller mesopores. An important result is further that the d. of the confined Kr phase at 87.3 K corresponds to the d. of supercooled liq. Kr, which is important for applying Kr adsorption for pore size anal. We used the results of our systematic Kr adsorption studies to develop a method for the characterization of thin micro/mesoporous SiO2 films based on Kr adsorption at liq. Ar temp. (87.3 K). This method allows detg. the pore size distribution of thin films in the pore diam. range from < 1 to ∼ 9 nm. [on SciFinder(R)]

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How to cite

APA:

Thommes, M. (2007). Aspects of a novel method for the pore size analysis of thin silica films based on krypton adsorption at liquid argon temperature (87.3 K). Studies in Surface Science and Catalysis, 165(Recent Progress in Mesostructured Materials), 551-554-554.

MLA:

Thommes, Matthias. "Aspects of a novel method for the pore size analysis of thin silica films based on krypton adsorption at liquid argon temperature (87.3 K)." Studies in Surface Science and Catalysis 165.Recent Progress in Mesostructured Materials (2007): 551-554-554.

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