Characterization of thin CeO2 films electrochemically deposited on HOPG
Faisal F, Toghan A, Khalakhan I, Vorokhta M, Matolin V, Libuda J (2015)
Publication Status: Published
Publication Type: Conference contribution
Publication year: 2015
Journal
Publisher: ELSEVIER SCIENCE BV
Book Volume: 350
Pages Range: 142-148
DOI: 10.1016/j.apsusc.2015.01.198
Abstract
Electrodeposition is widely used for industrial applications to deposit thin films, coatings, and adhesion layers. Herein, CeO2 thin films were deposited on a highly oriented pyrolytic graphite (HOPG) substrate by cathodic electrodeposition. The influence of the deposition parameters on the yield and on the film morphology is studied and discussed. Morphology and composition of the electrodeposited films were characterized by in-situ atomic force microscopy (AFM), scanning electron microscopy (SEM), Energy Dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). By AFM we show that the thickness of CeO2 films can be controlled via the Ce3+ concentration in solution and the deposition time. After exposing the films to ambient air, cracking structures are formed, which were analyzed by AFM in detail. The chemical composition of the deposits was analyzed by XPS indicating the formation of nearly stoichiometric CeO2. (C) 2015 Elsevier B.V. All rights reserved.
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APA:
Faisal, F., Toghan, A., Khalakhan, I., Vorokhta, M., Matolin, V., & Libuda, J. (2015). Characterization of thin CeO2 films electrochemically deposited on HOPG. (pp. 142-148). ELSEVIER SCIENCE BV.
MLA:
Faisal, Firas, et al. "Characterization of thin CeO2 films electrochemically deposited on HOPG." ELSEVIER SCIENCE BV, 2015. 142-148.
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