The thermal budget of hydrogen-related donor profiles: Diffusion-limited activation and thermal dissociation
Laven J, Job R, Schulze HJ, Niedernostheide FJ, Schustereder W, Frey L (2012)
Publication Status: Published
Publication Type: Conference contribution, Conference Contribution
Publication year: 2012
Book Volume: 50
Pages Range: 161-175
Event location: Honolulu, HI
ISBN: 9781607683537
Authors with CRIS profile
Johannes Laven
Lehrstuhl für Elektronische Bauelemente
Lothar Frey
Lehrstuhl für Elektronische Bauelemente
Involved external institutions
Germany (DE)How to cite
APA:
Laven, J., Job, R., Schulze, H.-J., Niedernostheide, F.J., Schustereder, W., & Frey, L. (2012). The thermal budget of hydrogen-related donor profiles: Diffusion-limited activation and thermal dissociation. In Proceedings of the 12th High Purity Silicon Symposium - 222nd ECS Meeting (pp. 161-175). Honolulu, HI.
MLA:
Laven, Johannes, et al. "The thermal budget of hydrogen-related donor profiles: Diffusion-limited activation and thermal dissociation." Proceedings of the 12th High Purity Silicon Symposium - 222nd ECS Meeting, Honolulu, HI 2012. 161-175.
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